TY  - JOUR
PB  - SciPost Foundation
DO  - 10.21468/SciPostChem.2.1.001
TI  - Ether cleavage and chemical removal of SU-8
PY  - 2023/04/13
UR  - https://www.scipost.org/SciPostChem.2.1.001
JF  - SciPost Chemistry
JA  - SciPost Chem.
VL  - 2
IS  - 1
SP  - 001
A1  - Ripalda, José M.
AU  - Álvaro, Raquel
AU  - Dotor, María Luisa
AB  - The high chemical stability of SU-8 makes it irreplaceable for a wide range of applications, most notably as a lithography photoresist for micro and nanotechnology. This advantage becomes a problem when there is a need to remove SU-8 from the fabricated devices. Researchers have been struggling for two decades with this problem, and although a number of partial solutions have been found, this difficulty has limited the applications of SU-8. Here we demonstrate a fast, reproducible, and comparatively gentle method to chemically remove SU-8 photoresist. An ether cleavage mechanism for the observed reaction is proposed, and the hypothesis is tested with ab initio quantum chemical calculations. We also describe a complementary removal method based on atomic hydrogen inductively coupled plasma.
ER  -

@Article{10.21468/SciPostChem.2.1.001,
	title={{Ether cleavage and chemical removal of SU-8}},
	author={José M. Ripalda and Raquel Álvaro and María Luisa Dotor},
	journal={SciPost Chem.},
	volume={2},
	pages={001},
	year={2023},
	publisher={SciPost},
	doi={10.21468/SciPostChem.2.1.001},
	url={https://scipost.org/10.21468/SciPostChem.2.1.001},
}